JEOL - CD Measurements on Masks

CD Measurements on Masks

CD Measurements on Masks

In this segment, JEOL represents HOLON, whose systems also offer outstanding image quality and can additionally function as fully automated CAD-based measuring systems (CATS automation).

 

Models:

For additional product information, please select a model from the following list.

  • JEOL EMU-270

    JEOL EMU-270

    CD measuring systems for masks (mask CD-SEM). High-performance system for 65 nm production masks and 45 nm process development, with "charging control system" for charge-free imaging.

 

Subject to technical changes; errors excepted. All brand names that appear in the text are registered trademarks of the manufacturers.

 

Exhibition Dates

  • Scandem

    12.06. - 15.06.2012 in Bergen, Norway

    63rd annual meeting of SCANDEM, the Nordic microscopy society

  • Euromar 2012

    01.07. - 05.07.2012 in Dublin, Ireland

    Annual international conference on Magnetic Resonance

  • Ultrapath XVI

    06.08. - 10.08.2012 in Regensburg, Germany

    Conference on Diagnostic Microscopy Basic Research & Oncology, located at the University Medical Center in Regensburg, Germany

All dates