The completely redesigned JIB-PS500i focused gallium ion beam (FIB) preparation system enables the fabrication, high-resolution imaging and analysis of thin TEM lamellae and cross-sections with unprecedented simplicity.
Especially in booming technology sectors such as battery or semiconductor production, ever higher demands are placed on the materials used. This increasingly requires a deep understanding of the fundamental workings even on the atomic scale. The new JEOL FIB system is designed to enable simple and high-quality preparation processes for high-resolution electron microscopy. Due to the large chamber and the very flexible stage, even large wafer samples can be processed for later TEM analysis. Thanks to newly designed software and fully integrated handling tools, this process is largely automated and easy to control even for beginners. New, integrated detectors also enable high-resolution imaging and EDX analysis already in the FIB system.
Find out more on our product page for the new FIB