Advances in the development of new materials featuring complex nanostructures increased demands on FIB-SEM instruments for exceptional resolution, accuracy and throughput. In response, JEOL has developed the JIB-4700F Multi Beam System to be used for morphological observations, elemental and crystallographic analyses of a variety of specimens.
The JIB-4700F features a hybrid conical objective lens, GentleBeam mode and an in-lens detector system to deliver a resolution of 1.6nm at a low accelerating voltage of 1 kV. Using an in-lens Schottky-FEG that produces an electron beam with a maximum probe-current of 300nA, this newly-developed instrument allows for high-resolution observations and fast analyses. For the FIB column, a high-current density Ga ion beam of up to 90nA probe-current is employed for fast ion milling and processing of specimens.
Concurrent with high-speed cross-section processing by FIB, high-resolution SEM observations and fast analyses can be conducted utilizing energy dispersive X-ray spectroscopy (EDS) and electron backscatter diffraction (EBSD). Additionally, a three-dimensional analysis function that automatically captures SEM images at certain intervals in cross-section processing is provided as one of the JIB-4700F's standard features.
SEM | |
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Accelerating voltage | 0.1 to 30.0kV |
Image resolution | 1.2nm (15kV, GB mode) |
Magnification | x20 to 1,000,000 |
Probe current | 1pA to 300nA |
Detector (*: option) | LED, UED, USD*, BED*, TED*, EDS* |
Specimen stage | Computerized 6-axis goniometer stage |
FIB | |
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Accelerating voltage | 1 to 30kV |
Image resolution | 4.0nm (30kV) |
Magnification | x50 to 300,000 |
Probe current | 1 pA to 90 nA, 13 steps |