When designing the new JBX-8100F, we took a completely new approach in terms of design and performance. By building on our proven lithography system, we created the JBX-8100F from the ground up. This allowed us to implement changes on a scale which would not be possible by incremental changes. While the new exterior design with its reduced footprint might be most striking at first glance, it's the changes within the system what truly constitute a leap forward. By using non-standard parts, we increased the freedom for our engineering team to design tailor made parts with higher performance.
The results is a truly innovative lithography system with a modular design, a reduced footprint and power consumption as well as the world highest scanning speed for even the most challenging applications.
In short, the new JBX-8100FS is quite simply the most innovative lithography system we have ever built.
|Version||G1 (Entry model)||G2 (Full option model)|
Spot beam, vector scan, step and repeat.
100 kV / 50 kV
5 × 10-12 ～ 2 × 10-7 A
Maximum 1,000 μm × 1,000 μm
Maximum 2,000 μm × 2,000 μm
Maximum 125 MHz
Stage movable area
190 mm × 170 mm
Electric requirements (Normal)
Maximum 200mmΦ wafer
Single auto loader
12 cassettes auto loader
Major installable Options
Subject to technical changes; errors excepted. All brand names that appear in the text are registered trademarks of the manufacturers.